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Last edited anonymously
April 30, 2008 | History

Fred H. Pollak

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  • Cover of: Spectroscopic characterization techniques for semiconductor technology: 9-10 November 1983, Cambridge, Massachusetts

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  • Cover of: Spectroscopic characterization techniques for semiconductor technology III: 14-15 March 1988, Newport Beach, California

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  • Cover of: Layered structures: heteroepitaxy, superlattices, strain, and metastability : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A.

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  • Cover of: Photoreflectance for in-situ characterization of MOCVD growth of semiconductors under micro-gravity conditions: final report

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  • Cover of: Spectroscopic characterization techniques for semiconductor technology II: January 21-22, 1985, Los Angeles, California

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  • Cover of: Modern optical characterization techniques for semiconductors and semiconductor devices

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  • Cover of: Surface and interface analysis of microelectronic materials processing and growth: 12-13 October 1989, Santa Clara, California

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  • Cover of: Diagnostic Techniques for Semiconductor Materials Processing II: Symposium Held November 27-30, 1995, Boston, Massachusetts, U.S.A (Materials Research Society Symposium Proceedings)

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April 30, 2008 Created by an anonymous user initial import