An edition of Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry
(1994)
Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry
by Brian Rennex
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Publish Date
1994
Publisher
U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology,
For sale by the Supt. of Docs., U.S. G.P.O.
Language
English
Pages
55
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| Edition | Availability |
|---|---|
1
Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry
1994, U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, For sale by the Supt. of Docs., U.S. G.P.O.
Microform
in English
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Libraries near you:
WorldCat
|
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2
Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry
1994, U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, For sale by the Supt. of Docs., U.S. G.P.O.
in English
|
aaaa
Libraries near you:
WorldCat
|
Book Details
Edition Notes
Includes bibliographical references (p. 15).
"Issued August 1994."
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The Physical Object
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| February 12, 2010 | Edited by WorkBot | add more information to works |
| December 10, 2009 | Created by WorkBot | add works page |