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Publish Date
1994
Publisher
U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology,
For sale by the Supt. of Docs., U.S. G.P.O.
Language
English
Pages
55
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Subjects
Silicon, Oxygen content, Measurement, StandardsShowing 2 featured editions. View all 2 editions?
Edition | Availability |
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1
Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry
1994, U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, For sale by the Supt. of Docs., U.S. G.P.O.
Microform
in English
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2
Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry
1994, U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, For sale by the Supt. of Docs., U.S. G.P.O.
in English
|
aaaa
Libraries near you:
WorldCat
|
Book Details
Edition Notes
Includes bibliographical references (p. 15).
"Issued August 1994."
Classifications
The Physical Object
ID Numbers
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- Created April 1, 2008
- 3 revisions
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November 21, 2020 | Edited by MARC Bot | import existing book |
December 11, 2009 | Edited by WorkBot | link works |
April 1, 2008 | Created by an anonymous user | Imported from Scriblio MARC record |