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Last edited by Clean Up Bot
July 31, 2019 | History
An edition of Proceedings of the Fourth International Symposium of Process Physics and Modeling in Semiconductor Technology
(1996)
Proceedings of the Fourth International Symposium of Process Physics and Modeling in Semiconductor Technology
by International Symposium on Process Physi..., Calif.) International Symposium on Proce..., G. R. Srinivasan, C. S. Murthy, S. T. Dunham
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This edition published in 1996 by Electrochemical Society in Pennington, NJ.
Written in English
— 528 pages
This edition doesn't have a description yet. Can you add one?
| Edition | Availability |
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1
Proceedings of the Fourth International Symposium of Process Physics and Modeling in Semiconductor Technology
1996, Electrochemical Society
in English
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2
Proceedings of the 4th International Symposium on Process Physics and Modeling (Proceedings (Electrochemical Society), V. 96-4.)
March 1996, Electrochemical Society
Hardcover
in English
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Proceedings of the Fourth International Symposium of Process Physics and Modeling in Semiconductor Technology — First published in 1996
Subjects
Congresses, Mathematical models, Defects, Ion implantation, Crystals, Semiconductors, Technology & Industrial Arts, Electronics - Semiconductors, Science/MathematicsClassifications
| Library of Congress | TK7871.85 .I5835 1996 |
| Dewey | 621.3815/2 |
Edition Notes
Includes bibliographical references and indexes.
Classifications
| July 31, 2019 | Edited by Clean Up Bot | associate edition with work OL3010423W |
| April 28, 2010 | Edited by Open Library Bot | Linked existing covers to the work. |
| February 12, 2010 | Edited by WorkBot | add more information to works |
| December 10, 2009 | Created by WorkBot | add works page |