An edition of Predictive Simulation of Semiconductor Processing
(2004)
Predictive Simulation of Semiconductor Processing
Status and Challenges
by Jarek Dabrowski
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Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
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Predictive Simulation of Semiconductor Processing: Status and Challenges
2004, Springer Berlin Heidelberg
electronic resource :
in English
3642058043 9783642058042
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Book Details
Table of Contents
Transistors and Atoms
Atomistic Simulations of Processes at Surfaces
Atomistic Simulations in Materials Processing
Atomistic Simulation of Decanano MOSFETs
Modeling and Simulation of Heterojunction Bipolar Transistors
Gate Oxide Reliability: Physical and Computational Models
High-K Dielectrics: The Example of Pr2O3
Atomistic Simulation of Si3N4 CVD from Dichlorosilane and NH3
Interconnects and Propagation of High Frequency Signals
Modeling of Electromigration in Interconnects
Predictive Modeling of Transition Metal Gathering: Applications and Materials Science Challenges.
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Mode of access: World Wide Web.
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