An edition of Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses (2002)

Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses

fundamental mechanisms and application to IC interconnect technology

by , , , and

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Chemical-mechanical polishing of low dielectr ...
Christopher L. Borst, Christop ...
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Last edited by MARC Bot
December 5, 2020 | History
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An edition of Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses (2002)

Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses

fundamental mechanisms and application to IC interconnect technology

by , , , and

  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
Kluwer Academic Publishers
Language
English
Pages
229

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Subjects

Polishing, Semiconductors, Grinding and polishing, Interconnects (Integrated circuit technology), Plastics & polymers technology, Science/Mathematics, Integrated Circuits, Technology, Technology & Industrial Arts, Chemistry - Organic, Electronics - Semiconductors, Engineering - Electrical & Electronic, Science-Chemistry - Organic, Technology / Electronics / Semiconductors, Technology / Engineering / Industrial, Technology-Engineering - Electrical & Electronic, Electronics - Circuits - Integrated, Interconnects (Integrated circ, Chemical mechanical planarization

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Edition Availability
Cover of: Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses
Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms And Application To Ic Interconnect Technology
Feb 23, 2014, Springer
paperback
Libraries near you: WorldCat
Cover of: Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses
Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology
2013, Springer London, Limited
in English
Libraries near you: WorldCat
Cover of: Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses
Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses: fundamental mechanisms and application to IC interconnect technology
2002, Kluwer Academic Publishers
in English
  • Not in Library
Libraries near you: WorldCat
Cover of: Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses
Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology
September 30, 2002, Springer
Hardcover in English - 1 edition
Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Boston

Classifications

Library of Congress
TK7874.53 .B67 2002, TK7874.53 .B67 2002, TS1-2301

The Physical Object

Pagination
xiv, 229 p. :
Number of pages
229

ID Numbers

Open Library
OL18179337M
ISBN 10
1402071930
LCCN
2002028782
Goodreads
3013313

Source records

Oregon Libraries MARC record
Library of Congress MARC record
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History

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December 5, 2020 Edited by MARC Bot import existing book
July 31, 2019 Edited by MARC Bot associate edition with work OL12343062W
January 23, 2010 Edited by WorkBot add more information to works
December 11, 2009 Created by WorkBot add works page