Principles of Chemical Vapor Deposition

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Last edited by MARC Bot
July 31, 2019 | History

Principles of Chemical Vapor Deposition

1 edition
  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

This edition doesn't have a description yet. Can you add one?

Publish Date
Publisher
Springer
Language
English
Pages
288

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Edition Availability
Cover of: Principles of Chemical Vapor Deposition
Principles of Chemical Vapor Deposition
April 1, 2003, Springer
Hardcover in English - 1 edition
Cover of: Principles of chemical vapor deposition
Principles of chemical vapor deposition
2003, Kluwer Academic Publishers
in English

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Book Details


First Sentence

"Inside most any semiconductor fabrication facility in the world at any given moment, there are operators and engineers standing in front of machines with shiny stainless steel facades, loading and unloading cassettes of wafers with complex patterns of dopants, defects, and films on their surfaces."

The Physical Object

Format
Hardcover
Number of pages
288
Dimensions
9.1 x 6.7 x 0.4 inches
Weight
1.4 pounds

ID Numbers

Open Library
OL8370545M
ISBN 10
1402012489
ISBN 13
9781402012488
Goodreads
307568

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
July 31, 2019 Edited by MARC Bot associate edition with work OL12345215W
April 24, 2010 Edited by Open Library Bot Fixed duplicate goodreads IDs.
April 16, 2010 Edited by bgimpertBot Added goodreads ID.
April 14, 2010 Edited by Open Library Bot Linked existing covers to the edition.
April 29, 2008 Created by an anonymous user Imported from amazon.com record.