An edition of Advanced processes for 193-nm immersion lithography (2009)

Advanced processes for 193-nm immersion lithography

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Cover of: Advanced processes for 193-nm immersion lithography by Yayi Wei
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Last edited by ImportBot
June 22, 2024 | History
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An edition of Advanced processes for 193-nm immersion lithography (2009)

Advanced processes for 193-nm immersion lithography

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Publish Date
Publisher
SPIE
Language
English

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Previews available in: English

Subjects
Semiconductors, Etching, Immersion lithography, Integrated circuits, Design and construction, Lithography

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Edition Availability
Cover of: Advanced processes for 193-nm immersion lithography
Advanced processes for 193-nm immersion lithography
2009, SPIE
in English
  • Not in Library
Libraries near you: WorldCat
Cover of: Advanced Processes for 193-Nm Immersion Lithography
Advanced Processes for 193-Nm Immersion Lithography
2009, SPIE
in English
Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Bellingham, Wash

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7872.M3 W45 2009, TK7872.M3W45 2009

The Physical Object

Pagination
p. cm.

ID Numbers

Open Library
OL22691451M
Internet Archive
advancedprocesse00weiy
ISBN 13
9780819475572
LCCN
2008050743
OCLC/WorldCat
276930418

Source records

Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record
Internet Archive item record
Library of Congress MARC record
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Promise Item

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
June 22, 2024 Edited by ImportBot import existing book
January 4, 2023 Edited by MARC Bot import existing book
December 3, 2022 Edited by ImportBot import existing book
December 25, 2021 Edited by ImportBot import existing book
December 12, 2008 Created by ImportBot Imported from Library of Congress MARC record