| Record ID | marc_loc_updates/v36.i48.records.utf8:5108441:781 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v36.i48.records.utf8:5108441:781?format=raw |
LEADER: 00781nam a22002538a 4500
001 2008050743
003 DLC
005 20081201123448.0
008 081121s2009 wau b 001 0 eng
010 $a 2008050743
020 $a9780819475572 (alk. paper)
040 $aDLC$cDLC
050 00 $aTK7872.M3$bW45 2009
082 00 $a621.3815/31$222
100 1 $aWei, Yayi.
245 10 $aAdvanced processes for 193-nm immersion lithography /$cYayi Wei and Robert L. Brainard.
260 $aBellingham, Wash. :$bSPIE,$cc2009.
263 $a0902
300 $ap. cm.
504 $aIncludes bibliographical references and index.
650 0 $aImmersion lithography.
650 0 $aSemiconductors$xEtching.
650 0 $aIntegrated circuits$xDesign and construction.
700 1 $aBrainard, Robert L.