An edition of Copper-fundamental mechanisms for microelectronic applications
(2000)
Copper-Fundamental Mechanisms for Microelectronic Applications
by S. P Murarka, Shyam P. Murarka, Igor V. Verner, and Ronald J. Gutmann
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Subjects
Semiconductors, Copper, Materials, Metallizing, Microelectronics, Junctions| Edition | Availability |
|---|---|
1
Copper -- Fundamental Mechanisms for Microelectronic Applications
2008, Wiley & Sons, Incorporated, John
in English
0470347872 9780470347874
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2
Copper-Fundamental Mechanisms for Microelectronic Applications
March 10, 2000, Wiley-Interscience
in English
0471252565 9780471252566
|
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3
Copper-fundamental mechanisms for microelectronic applications
2000, John Wiley
in English
0471252565 9780471252566
|
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Book Details
First Sentence
"One of the many important properties of metals is the low electrical resistivity, making them perhaps the most important materials to carry electrical current from one location to another separated by small or large distances."
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- Created April 29, 2008
- 5 revisions
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| July 31, 2019 | Edited by MARC Bot | associate edition with work OL11993572W |
| April 24, 2010 | Edited by Open Library Bot | Fixed duplicate goodreads IDs. |
| April 16, 2010 | Edited by bgimpertBot | Added goodreads ID. |
| April 14, 2010 | Edited by Open Library Bot | Linked existing covers to the edition. |
| April 29, 2008 | Created by an anonymous user | Imported from amazon.com record |