An edition of VLSI and Post-CMOS Electronics
(2019)
VLSI and Post-CMOS Electronics
Devices, Circuits and Interconnects, Volume 2
by Rohit Dhiman and Rajeevan Chandel
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Subjects
Integrated circuits, very large scale integration, Metal oxide semiconductors, complementary, Integrated circuits, Very large scale integration, Complementary Metal oxide semiconductors, Circuits intégrés à très grande échelle, MOS complémentaires, CMOS integrated circuits, Elemental semiconductors, Integrated circuit design, Low-power electronics, Magnetoelectronics, MOSFET, Signal processing, Silicon, Thin film transistors, Tunnel field-effect transistors, Dielectric measurements, Dielectrics, Electric resistance, Electronic apparatus and appliances, Computer-aided design, Design and construction, Metal oxide semiconductor field-effect transistors, Semiconductors, Mesures diélectriques, Diélectriques, Résistance électrique, Circuits intégrés, Conception assistée par ordinateur, Conception et construction, Transistors MOSFET, Semi-conducteurs, Silicium, Resistivity, Semiconductor, III-V semiconductors, Permittivity, Semiconductor device models, SRAM chips, Technology CAD (electronics), Three-dimensional integrated circuits, VLSI| Edition | Availability |
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VLSI and Post-CMOS Electronics: Devices, Circuits and Interconnects, Volume 2
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VLSI and Post-CMOS Electronics: Design, Modelling and Simulation
2019, Institution of Engineering & Technology, The Institution of Engineering and Technology
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