An edition of Handbook of plasma processing technology
(1990)
Handbook of plasma processing technology
fundamentals, etching, deposition, and surface interactions
by Stephen M. Rossnagel and William D. Westwood
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Subjects
Plasma engineering, Semiconductors, Etching, Plasma etching, Plasma dynamics, Plasma (ionized gases), Technique des plasmas, Semi-conducteurs, Attaque chimique, Gravure par plasma, Mechanical, Materials science, Microelectronics, Metallurgy, Trades & technology -> industrial technology -> materials science, Professional, career & trade -> electronics -> general, Trades & technology -> industrial technology -> metallurgy, Trades & technology -> industrial technology -> mechanical| Edition | Availability |
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Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions
1990, Noyes Publications
in English
0815512201 9780815512202
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Includes bibliographical references.
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- Created April 1, 2008
- 13 revisions
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| July 25, 2024 | Edited by MARC Bot | import existing book |
| December 20, 2023 | Edited by ImportBot | import existing book |
| December 20, 2022 | Edited by MARC Bot | import existing book |
| November 9, 2020 | Edited by MARC Bot | import existing book |
| April 1, 2008 | Created by an anonymous user | Imported from Scriblio MARC record |