An edition of Plasma etching and reactive ion etching
(1982)
Plasma etching and reactive ion etching
by J. W. Coburn
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Last edited by Open Library Bot
December 5, 2010 | History
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Subjects
Etching, Plasma etching, SemiconductorsShowing 1 featured edition. View all 1 editions?
| Edition | Availability |
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1
Plasma etching and reactive ion etching
1982, American Institute of Physics
in English
0883184060 9780883184066
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New York, N.Y
Edition Notes
Includes bibliographical references.
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| December 5, 2010 | Edited by Open Library Bot | Added subjects from MARC records. |
| April 28, 2010 | Edited by Open Library Bot | Linked existing covers to the work. |
| December 10, 2009 | Created by WorkBot | add works page |