Technical impediments to a more effective utilization of neutron transmutation doped silicon for high-power device fabrication

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Technical impediments to a more effective uti ...
D. R. Myers
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Last edited by MARC Bot
November 15, 2023 | History

Technical impediments to a more effective utilization of neutron transmutation doped silicon for high-power device fabrication

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Cover of: Technical impediments to a more effective utilization of neutron transmutation doped silicon for high-power device fabrication
Technical impediments to a more effective utilization of neutron transmutation doped silicon for high-power device fabrication
1980, U.S. Dept. of Commerce, National Bureau of Standards, for sale by the Supt. of Docs., U.S. Govt. Print. Off.
in English

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Book Details


Edition Notes

Includes bibliographical references.
"Issued May 1980."

Published in
Washington, D.C
Series
National Bureau of Standards Special publication ;, 400-60, Semiconductor measurement technology, NBS special publication ;, 400-60., Semiconductor measurement technology.

Classifications

Dewey Decimal Class
602/.18 s, 621.3815/287
Library of Congress
QC100 .U57 no. 400-60, TK7871.85 .U57 no. 400-60

The Physical Object

Pagination
iii, 29 p. ;
Number of pages
29

ID Numbers

Open Library
OL4236014M
LCCN
80600047
OCLC/WorldCat
6348908

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History

Download catalog record: RDF / JSON
November 15, 2023 Edited by MARC Bot import existing book
December 5, 2010 Edited by Open Library Bot Added subjects from MARC records.
December 10, 2009 Created by WorkBot add works page