An edition of Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV (1994)

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV

28 February-1 March 1994, San Jose, California

Cover of: Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV by David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
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Last edited by MARC Bot
July 14, 2024 | History
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An edition of Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV (1994)

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV

28 February-1 March 1994, San Jose, California

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Publish Date
Publisher
SPIE
Language
English
Pages
420

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Previews available in: English

Subjects

Electron beam Lithography, Congresses, Etching, Ion beam lithography, X-ray lithography, Semiconductors, Masks (Electronics), Lithography, electron beam
Edition Availability
Cover of: Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV: 28 February-1 March 1994, San Jose, California
1994, SPIE
in English

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Bellingham, Wash
Series
Proceedings / SPIE--the International Society for Optical Engineering ;, v. 2194, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 2194.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7874 .E4818 1994, TK7874.E4818 1994

The Physical Object

Pagination
vii, 420 p. :
Number of pages
420

Edition Identifiers

Open Library
OL1124522M
Internet Archive
isbn_0819414891_2194
ISBN 10
0819414891
LCCN
94065789
OCLC/WorldCat
30614005

Work Identifiers

Work ID
OL23536507W

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