An edition of 17th Annual Symposium on Photomask Technology and Management (1998)

17th Annual Symposium on Photomask Technology and Management

[proceedings] : 17-19 September, 1997, Redwood City, California

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Cover of: 17th Annual Symposium on Photomask Technology and Management by Symposium on Photomask Technology and Management (17th 1997 Redwood City, California)
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Last edited by ImportBot
July 13, 2023 | History
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An edition of 17th Annual Symposium on Photomask Technology and Management (1998)

17th Annual Symposium on Photomask Technology and Management

[proceedings] : 17-19 September, 1997, Redwood City, California

by

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
SPIE
Language
English
Pages
554

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Previews available in: English

Subjects
Congresses, Integrated circuits, Masks, Microlithography, Optics

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Edition Availability
Cover of: 17th Annual Symposium on Photomask Technology and Management
17th Annual Symposium on Photomask Technology and Management: [proceedings] : 17-19 September, 1997, Redwood City, California
1998, SPIE
in English
Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Bellingham, Washington
Series
SPIE proceedings series ;, v. 3236, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 3236.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7874 .S9435 1997, TK7874.S9435 1997

The Physical Object

Pagination
ix, 554 p. :
Number of pages
554

ID Numbers

Open Library
OL464685M
ISBN 10
0819426695
LCCN
98184513
OCLC/WorldCat
38828787
Goodreads
5045964

Source records

Library of Congress MARC record
Better World Books record
Internet Archive item record
marc_columbia MARC record

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History

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July 13, 2023 Edited by ImportBot import existing book
January 17, 2023 Edited by ImportBot import existing book
February 4, 2010 Edited by WorkBot add more information to works
December 9, 2009 Created by WorkBot add works page