An edition of Handbook of plasma processing technology
(1990)
Handbook of Plasma Processing Technology
Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology)
by Stephen M. Rossnagel, Jerome J. Cuomo, and William D. Westwood
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Plasma engineering, Semiconductors, Etching, Plasma etching| Edition | Availability |
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1
Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology)
January 1, 1990, Noyes Publications
Hardcover
in English
0815512201 9780815512202
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2
Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions
1990, Elsevier Science & Technology Books
in English
0815517645 9780815517641
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Book Details
First Sentence
"The driving force for the rapid development of plasma based processing over the past 15 years has been the microelectronics industry and in particular, the fabrication of silicon integrated circuits."
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| April 9, 2019 | Created by MARC Bot | import existing book |