An edition of Plasma assisted processes for microelectronic applications (1988)

Plasma assisted processes for microelectronic applications

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Plasma assisted processes for microelectronic ...
Claes Nender, Claes Nender
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Last edited by MARC Bot
September 1, 2024 | History
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An edition of Plasma assisted processes for microelectronic applications (1988)

Plasma assisted processes for microelectronic applications

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Publish Date
Publisher
Uppsala Universitet
Language
English
Pages
21

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Subjects

Plasma etching, Plasma engineering, Microelectronics
Edition Availability
Cover of: Plasma assisted processes for microelectronic applications
Plasma assisted processes for microelectronic applications
1988, Uppsala Universitet
in English

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Book Details

Edition Notes

Thesis (doctoral)--Uppsala University, 1988.

Includes bibliographical references (p. 21)

Published in
Uppsala
Series
Acta Universitatis Upsaliensis -- 137

The Physical Object

Pagination
21 p.
Number of pages
21

Edition Identifiers

Open Library
OL53572432M
ISBN 10
9155421997
ISBN 13
9789155421991
OCLC/WorldCat
19470321

Work Identifiers

Work ID
OL39365938W

Source records

Harvard University record

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Download catalog record: RDF / JSON / OPDS | Wikipedia citation
September 1, 2024 Created by MARC Bot Imported from Harvard University record