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Previews available in: English
Edition | Availability |
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1
Photomask and next-generation lithography mask technology X: 16-18 April, 2003, Yokohama, Japan
2003, SPIE
in English
0819449962 9780819449962
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Book Details
Edition Notes
Includes bibliographical references and author index.
Some earlier proceedings have title: Photomask and X-ray mask technology.
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The Physical Object
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- Created April 1, 2008
- 9 revisions
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May 25, 2023 | Edited by ImportBot | import existing book |
January 7, 2023 | Edited by MARC Bot | import existing book |
December 8, 2020 | Edited by MARC Bot | import existing book |
October 8, 2020 | Edited by ImportBot | import existing book |
April 1, 2008 | Created by an anonymous user | Imported from Scriblio MARC record |