Photomask and next-generation lithography mask technology X

16-18 April, 2003, Yokohama, Japan

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Last edited by ImportBot
May 25, 2023 | History

Photomask and next-generation lithography mask technology X

16-18 April, 2003, Yokohama, Japan

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Publish Date
Publisher
SPIE
Language
English
Pages
1066

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Previews available in: English

Book Details


Edition Notes

Includes bibliographical references and author index.
Some earlier proceedings have title: Photomask and X-ray mask technology.

Published in
Bellingham, Wash
Series
SPIE proceedings series ;, v. 5130, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 5130.
Genre
Congresses.
Other Titles
Photomask and X-ray mask technology

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7878 .P565 2003, TK7878.P565 2003

The Physical Object

Pagination
xxi, 1066 p. :
Number of pages
1066

Edition Identifiers

Open Library
OL3320271M
Internet Archive
photomasknextgen5130unse
ISBN 10
0819449962
LCCN
2004272211
OCLC/WorldCat
53173174
Goodreads
3037526

Work Identifiers

Work ID
OL5748747W

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History

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May 25, 2023 Edited by ImportBot import existing book
January 7, 2023 Edited by MARC Bot import existing book
December 8, 2020 Edited by MARC Bot import existing book
October 8, 2020 Edited by ImportBot import existing book
April 1, 2008 Created by an anonymous user Imported from Scriblio MARC record