An edition of Advances in resist materials and processing technology XXIV
(2007)
Advances in resist materials and processing technology XXIV
26-28 February, 2007, San Jose, California, USA
by Qinghuang Lin
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Photoresists, Congresses, Microlithography| Edition | Availability |
|---|---|
1
Advances in resist materials and processing technology XXIV: 26-28 February, 2007, San Jose, California, USA
2007, SPIE
in English
0819466387 9780819466389
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2
Advances in resist materials and processing technology XXIV: 26-28 February, 2007, San Jose, California, USA
2007, SPIE, Society of Photo Optical
in English
0819466387 9780819466389
|
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|
Book Details
Edition Notes
Previous conference proceedings entitled: Advances in resist technology and processing.
Includes bibliographical references and author index.
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- Created March 2, 2010
- 2 revisions
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| July 31, 2019 | Edited by MARC Bot | associate edition with work OL18664339W |
| March 2, 2010 | Created by ImportBot | Imported from Library of Congress MARC record |