Principles of plasma discharges and materials processing
by M. A. Lieberman
Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications - especially in the fabrication of integrated circuits.
With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.
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| Edition | Availability |
|---|---|
1
Principles of plasma discharges and materials processing
2005, Wiley-Interscience
in English
- 2nd ed.
0471720011 9780471720010
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2
Principles of plasma discharges and materials processing
2004, Wiley-Interscience
in English
- 2nd ed.
0471720011 9780471720010
|
aaaa
|
3
Principles of plasma discharges and materials processing
1994, Wiley
in English
0471005770 9780471005773
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- Created November 17, 2008
- 7 revisions
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| March 28, 2025 | Edited by ImportBot | Redacting ocaids |
| May 16, 2020 | Edited by CoverBot | Added new cover |
| April 6, 2014 | Edited by ImportBot | Added IA ID. |
| August 19, 2010 | Edited by IdentifierBot | added LibraryThing ID |
| November 17, 2008 | Created by ImportBot | Imported from University of Toronto MARC record |