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Plasma etching processes for sub-quarter micron devices: proceedings of the International Symposium
2000, Electrochemical Society.
in English
1566772532 9781566772532
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Edition Notes
"This proceedings volume contains the papers presented at the symposium on Plasma Etching Processes for Sub-Quarter Micron Devices. The symposium ... was held in Honolulu, HI, October 17-22, 1999 ..."--Preface.
Includes bibliographic references and indexes.
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- Created October 22, 2008
- 6 revisions
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July 20, 2024 | Edited by MARC Bot | import existing book |
August 3, 2020 | Edited by MARC Bot | add LCCN |
July 29, 2020 | Edited by MARC Bot | import existing book |
February 17, 2019 | Edited by MARC Bot | import existing book |
October 22, 2008 | Created by ImportBot | Imported from University of Toronto MARC record |