Plasma etching processes for sub-quarter micron devices

proceedings of the International Symposium

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Last edited by MARC Bot
July 20, 2024 | History

Plasma etching processes for sub-quarter micron devices

proceedings of the International Symposium

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Language
English
Pages
378

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Edition Availability
Cover of: Plasma etching processes for sub-quarter micron devices

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Book Details


Edition Notes

"This proceedings volume contains the papers presented at the symposium on Plasma Etching Processes for Sub-Quarter Micron Devices. The symposium ... was held in Honolulu, HI, October 17-22, 1999 ..."--Preface.

Includes bibliographic references and indexes.

Published in
Pennington, New Jersey
Series
Proceedings -- v. 99-30, Proceedings (Electrochemical Society) -- 99-30.
Genre
Congresses.

Classifications

Library of Congress
TA2020 .P515 1999, TA2020 .P52 2000

The Physical Object

Pagination
x, 378 p. :
Number of pages
378

ID Numbers

Open Library
OL19540264M
ISBN 10
1566772532
LCCN
00101648
OCLC/WorldCat
44074969

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
July 20, 2024 Edited by MARC Bot import existing book
August 3, 2020 Edited by MARC Bot add LCCN
July 29, 2020 Edited by MARC Bot import existing book
February 17, 2019 Edited by MARC Bot import existing book
October 22, 2008 Created by ImportBot Imported from University of Toronto MARC record