SiGe and Si strained-layer epitaxy for silicon heterostructure devices

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Last edited by ImportBot
March 28, 2025 | History

SiGe and Si strained-layer epitaxy for silicon heterostructure devices

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Publish Date
Language
English

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Edition Availability
Cover of: SiGe and Si strained-layer epitaxy for silicon heterostructure devices
SiGe and Si strained-layer epitaxy for silicon heterostructure devices
2008, CRC Press/Taylor & Francis
in English

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Book Details


Edition Notes

"The material was previously published in Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy, Taylor and Francis, 2005"--T.p. verso.

Includes bibliographical references and index.

Published in
Boca Raton
Other Titles
Silicon heterostructure handbook.

Classifications

Dewey Decimal Class
621.3815/28
Library of Congress
TK7871.96.B55 S53 2008

The Physical Object

Pagination
1 v. (various pagings) :

Edition Identifiers

Open Library
OL18277270M
ISBN 10
1420066854
ISBN 13
9781420066852
LCCN
2007030343
Goodreads
2795874

Work Identifiers

Work ID
OL16971206W

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
March 28, 2025 Edited by ImportBot Redacting ocaids
May 13, 2020 Edited by CoverBot Added new cover
July 29, 2014 Edited by ImportBot import new book
April 6, 2014 Edited by ImportBot Added IA ID.
October 15, 2008 Created by ImportBot Imported from Library of Congress MARC record