An edition of Chemical vapor deposition (1995)

Chemical vapor deposition

thermal and plasma deposition of electronic materials

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Last edited by Open Library Bot
April 28, 2010 | History
An edition of Chemical vapor deposition (1995)

Chemical vapor deposition

thermal and plasma deposition of electronic materials

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Language
English
Pages
292

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Previews available in: English

Edition Availability
Cover of: Chemical vapor deposition
Chemical vapor deposition: thermal and plasma deposition of electronic materials
1995, Van Nostrand Reinhold
in English

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Book Details


Edition Notes

Includes bibliographical references and index.

Published in
New York

Classifications

Dewey Decimal Class
621.3815/2
Library of Congress
TK7836 .S54 1995

The Physical Object

Pagination
xii, 292 p. :
Number of pages
292

ID Numbers

Open Library
OL1113768M
Internet Archive
chemicalvapordep0000siva
ISBN 10
0442010796
LCCN
94039696
OCLC/WorldCat
31330483
Goodreads
307572

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History

Download catalog record: RDF / JSON
April 28, 2010 Edited by Open Library Bot Linked existing covers to the work.
February 14, 2010 Edited by WorkBot add more information to works
December 10, 2009 Created by WorkBot add works page