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Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. Starting out with the history of semiconductor-laser development and applications the materials for use in lasing from short to long wavelengths are reviewed. The basic design principles for semiconductor- laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies, respectively. The characterizations of laser materials, and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.
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Subjects
Lasers, Laser materials, Crystal growth, Epitaxy, Quantum optics, Physics, Engineering, Electronics, Photonics Laser Technology, Superconductivity Strongly Correlated Systems, Instrumentation Electronics and Microelectronics, Engineering, general, Optics, Optoelectronics, Plasmonics and Optical Devices| Edition | Availability |
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Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses
2013, Springer London, Limited
in English
3642795765 9783642795763
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Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses
Dec 21, 2011, Springer
paperback
3642795781 9783642795787
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Book Details
Edition Notes
Source title: Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses (Springer Series in Materials Science (30))

