Process Technology for Semiconductor Lasers

Crystal Growth and Microprocesses

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Last edited by MARC Bot
September 28, 2024 | History

Process Technology for Semiconductor Lasers

Crystal Growth and Microprocesses

Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. Starting out with the history of semiconductor-laser development and applications the materials for use in lasing from short to long wavelengths are reviewed. The basic design principles for semiconductor- laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies, respectively. The characterizations of laser materials, and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.

Publish Date
Publisher
Springer
Pages
179

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Edition Availability
Cover of: Process Technology for Semiconductor Lasers
Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses
2013, Springer London, Limited
in English
Cover of: Process Technology for Semiconductor Lasers
Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses
Dec 21, 2011, Springer
paperback
Cover of: Process Technology for Semiconductor Lasers
Process Technology for Semiconductor Lasers
1996, Island Press
in English

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Book Details


Edition Notes

Source title: Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses (Springer Series in Materials Science (30))

Classifications

Library of Congress
TA1671-1707TA1501-18, TA1671-1707, TA1501-1820

The Physical Object

Format
paperback
Number of pages
179

Edition Identifiers

Open Library
OL29690015M
ISBN 10
3642795781
ISBN 13
9783642795787

Work Identifiers

Work ID
OL21797427W

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