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64- to 256-megabit reticle generation: technology requirements and approaches
1994, SPIE Optical Engineering Press
in English
0819413577 9780819413574
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Edition Notes
Includes bibliographical references and index.
"Proceedings of a conference held 24 September 1993, Santa Clara, California, sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology."
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