An edition of 64- to 256-megabit reticle generation (1994)

64- to 256-megabit reticle generation

technology requirements and approaches

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64- to 256-megabit reticle generation
Gregory K. Hearn, editor.
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February 19, 2019 | History
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An edition of 64- to 256-megabit reticle generation (1994)

64- to 256-megabit reticle generation

technology requirements and approaches

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
SPIE Optical Engineering Press
Language
English
Pages
273

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Subjects
Congresses, Integrated circuits, Semiconductor storage devices, Reticles, Microlithography, Masks, Design and construction

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Edition Availability
Cover of: 64- to 256-megabit reticle generation
64- to 256-megabit reticle generation: technology requirements and approaches
1994, SPIE Optical Engineering Press
in English
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Book Details

Edition Notes

Includes bibliographical references and index.
"Proceedings of a conference held 24 September 1993, Santa Clara, California, sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology."

Published in
Bellingham, Wash
Series
Critical reviews of optical science and technology ;, v. CR51
Other Titles
Sixty-four to two hundred fifty-six-megabit reticle generation.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7874 .A13 1994

The Physical Object

Pagination
vii, 273 p. :
Number of pages
273

ID Numbers

Open Library
OL1434299M
ISBN 10
0819413577, 0819413585
LCCN
93046150
Goodreads
4707951
7027420

Source records

Scriblio MARC record
Library of Congress MARC record

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February 19, 2019 Created by MARC Bot import existing book