An edition of Emerging lithographic technologies XI (2007)

Emerging lithographic technologies XI

27 February- 1 March 2007, San Jose, California, USA

Emerging lithographic technologies XI
Michael J. Lercel, editor ; sp ...
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Last edited by ImportBot
August 2, 2020 | History
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An edition of Emerging lithographic technologies XI (2007)

Emerging lithographic technologies XI

27 February- 1 March 2007, San Jose, California, USA

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Electron beam Lithography, X-rays, X-ray lithography, Congresses, Masks (Electronics), Industrial applications, Microlithography, Lithography, X-rays, industrial applications, Masks (electronics)
Edition Availability
Cover of: Emerging lithographic technologies XI
Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA
2007, SPIE
in English
Cover of: Emerging lithographic technologies XI
Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA
2007, SPIE
in English

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Book Details

Edition Notes

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 6517, Proceedings of SPIE--the International Society for Optical Engineering -- v. 6517.
Genre
Congresses

Classifications

Library of Congress
TK7874 .E56 2007

The Physical Object

Pagination
2 v. :

Edition Identifiers

Open Library
OL24063275M
ISBN 10
0819466360
ISBN 13
9780819466365
LCCN
2009284503

Work Identifiers

Work ID
OL18634414W

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August 2, 2020 Edited by ImportBot import existing book
February 10, 2019 Created by MARC Bot import existing book