An edition of Optical microlithography XXII (2009)

Optical microlithography XXII

24-27 February 2009, San Jose, California, United States

by and

Optical microlithography XXII
Harry J. Levinson, Mircea V. D ...
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Last edited by LC Bot
October 27, 2011 | History
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An edition of Optical microlithography XXII (2009)

Optical microlithography XXII

24-27 February 2009, San Jose, California, United States

by and

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Integrated circuits, Congresses, Masks, X-ray lithography, Microlithography, Manufacturing processes
Edition Availability
Cover of: Optical microlithography XXII
Optical microlithography XXII: 24-27 February 2009, San Jose, California, United States
2009, SPIE
in English

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Book Details

Edition Notes

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7274, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7274.

Classifications

Library of Congress
TK7835 .O6652 2009

The Physical Object

Pagination
2 v. :

Edition Identifiers

Open Library
OL25081891M
ISBN 10
0819475270
ISBN 13
9780819475275
LCCN
2011499390
OCLC/WorldCat
325000265

Work Identifiers

Work ID
OL16219022W

Source records

Library of Congress MARC record
Library of Congress MARC record

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October 27, 2011 Created by LC Bot import new book