De-alloying, an anodic dissolution of less noble atoms from an alloy, produces peculiar metallic nanostructures possessing highly curved, nanoscale pores densely interconnected in the de-alloyed layer. A novel, near-bulk electrodeposition of metallic nanoparticles in these nanoscale cavities at potentials slightly above metal ion/metal equilibrium voltages is demonstrated as feasible in this work; "sub-potential deposition (SPD)" or "curvature-driven deposition (CDD)" is used to distinguish this newly discovered phenomenon from ordinary monolayer under-potential depositions (UPD) in electrochemistry. Electrochemical impedance spectroscopy (EIS) measurements show capacitance changes before and after inoculating foreign metallic atoms into de-alloyed layers, indicating the remaining connectivity of nanoporosity, which is consistent with the coulometry analysis revealing partial re-filling of nanoscale cavities by SPD. Capacitance obtained by EIS is applied to estimate pore sizes of de-alloyed Cu-Pt layers whose morphology is examined by scanning electron microscopy (SEM). X-ray diffraction (XRD) for de-alloyed Cu-Pt layers inoculated with copper is also investigated.