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An edition of Dry etching for microelectronics (1984)

Dry etching for microelectronics

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Cover of: Dry etching for microelectronics by Ronald A. Powell
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Last edited by MARC Bot
December 11, 2022 | History
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An edition of Dry etching for microelectronics (1984)

Dry etching for microelectronics

by

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Publish Date
Publisher
North-Holland Physics Pub., Distributors for the USA and Canada, Elsevier Science Pub. Co.
Language
English
Pages
299

Subjects

Semiconductors Etching Plasma etching
Edition Availability
Cover of: Dry etching for microelectronics
Dry etching for microelectronics
1984, North-Holland Physics Pub., Distributors for the USA and Canada, Elsevier Science Pub. Co.
in English

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Book Details

Edition Notes

Bibliography: p. 223-294.
Includes index.

Published in
Amsterdam, New York, New York, N.Y
Series
Materials processing--theory and practices ;, v. 4, Materials processing, theory and practices ;, v. 4.

Classifications

Dewey Decimal Class
621.381/73
Library of Congress
TK7871.85 .D79 1984

The Physical Object

Pagination
xi, 299 p. :
Number of pages
299

Edition Identifiers

Open Library
OL2839348M
ISBN 10
0444869050
LCCN
84001145
OCLC/WorldCat
10913832
Goodreads
5362382

Work Identifiers

Work ID
OL22821615W

Source records

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{{cite book|author=Ronald A. Powell |date=1984 |title=Dry etching for microelectronics |publication-place=Amsterdam |publisher=North-Holland Physics Pub. |isbn=0-444-86905-0 |lccn=84001145 |oclc=10913832 |ol=2839348M}}