An edition of Chemical Vapor Deposition for Microelectronics
(1987)
Chemical Vapor Deposition for Microelectronics
Principles, Technology, and Applications (Materials Science and Process Technology)
by Arthur Sherman
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| Edition | Availability |
|---|---|
1
Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology)
March 1, 1988, Noyes Publications
Hardcover
in English
0815511361 9780815511366
|
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WorldCat
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2
Chemical vapor deposition for microelectronics: principles, technology, and applications
1987, Noyes Publications
in English
0815511361 9780815511366
|
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Libraries near you:
WorldCat
|
Book Details
First Sentence
"Chemical vapor deposition (CVD) is a process where one or more gaseous species react on a solid surface and one of the reaction products is a solid phase material."
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- Created April 29, 2008
- 7 revisions
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| July 29, 2014 | Edited by ImportBot | import new book |
| April 6, 2014 | Edited by ImportBot | Added IA ID. |
| April 24, 2010 | Edited by Open Library Bot | Fixed duplicate goodreads IDs. |
| April 16, 2010 | Edited by bgimpertBot | Added goodreads ID. |
| April 29, 2008 | Created by an anonymous user | Imported from amazon.com record |