Handbook of physical vapor deposition (PVD) processing

2nd ed.
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October 31, 2022 | History

Handbook of physical vapor deposition (PVD) processing

2nd ed.
  • 0 Ratings
  • 4 Want to read
  • 0 Currently reading
  • 0 Have read

This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature.^

In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired.^

The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.^

Fully revised and updated to include the latest developments in PVD process technology 'War stories' drawn from the author's extensive experience emphasize important points in development and manufacturing Appendices include listings of periodicals and professional societies, terms and acronyms, and material on transferring technology between R&D and manufacturing.

Publish Date
Language
English

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Cover of: Handbook of physical vapor deposition (PVD) processing
Handbook of physical vapor deposition (PVD) processing
2010, William Andrew, Elsevier Science [distributor]
electronic resource / in English - 2nd ed.
Cover of: Handbook of physical vapor deposition (PVD) processing
Cover of: Handbook of physical vapor deposition (PVD) processing

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Book Details


Table of Contents

Substrate ("Real") Surfaces and Surface Modification
The "Good" Vacuum (Low Pressure) Processing Environment
The Sub-Atmospheric Processing Environments
The Low-Pressure Plasma Processing Environment
Vacuum Evaporation and Vacuum Deposition
Physical Sputtering and Sputter Deposition (Sputtering)
Arc Vapor Deposition
Ion Plating and Ion Beam Assisted Deposition
Atomistic Film Growth and Some Growth-Related Film Properties
Film Characterization and Some Basic Film Properties
Adhesion and Deadhesion
Cleaning
External Processing Environment
Transfer of Technology from R&D to Manufacturing.

Edition Notes

Includes index.

Electronic reproduction. Amsterdam : Elsevier Science & Technology, 2010. Mode of access: World Wide Web. System requirements: Web browser. Title from title screen (viewed on May 12, 2010). Access may be restricted to users at subscribing institutions.

Mode of access: World Wide Web.

Published in
Norwich, N.Y, Oxford
Other Titles
Physical vapor deposition (PVD) processing

Classifications

Library of Congress
TS695 .M38 2010, TS695

The Physical Object

Format
[electronic resource] /
Pagination
1 online resource.

ID Numbers

Open Library
OL25555274M
Internet Archive
handbookphysical00matt
ISBN 10
0815520379
ISBN 13
9780815520375, 9780080951959
OCLC/WorldCat
613958939

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
October 31, 2022 Edited by ImportBot import existing book
October 9, 2020 Edited by ImportBot import existing book
August 2, 2020 Edited by ImportBot import existing book
May 16, 2020 Edited by CoverBot Added new cover
July 29, 2014 Created by ImportBot Imported from Internet Archive item record