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Since 1995, the noncontact atomic force microscope (NC-AFM) has achieved remarkable progress. Based on nanomechanical methods, the NC-AFM detects the weak attractive force between the tip of a cantilever and a sample surface. This method has the following characteristics: it has true atomic resolution; it can measure atomic force interactions, i.e. it can be used in so-called atomic force spectroscopy (AFS); it can also be used to study insulators; and it can measure mechanical responses such as elastic deformation. This is the first book that deals with all of the emerging NC-AFM issues.
Publish Date
2002
Publisher
Springer Berlin Heidelberg,
Imprint,
Springer
Language
English
Pages
439
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Noncontact Atomic Force Microscopy
2002, Springer Berlin Heidelberg, Imprint, Springer
electronic resource /
in English
3642560199 9783642560194
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Book Details
Table of Contents
Introduction
Principles of NC-AFM
Semiconductor Surfaces
Bias Dependence of NC-AFM Images and Tunneling Current Variations on Semiconductors
Alkali Halides
Atomic Resolution Imaging on Fluorides
Atomically Resolved Imaging of a NiO(001) Surface
Atomic Structure, Order and Disorder of High-Temperature Reconstructed alpha-Al2O3(0001)
NC-AFM Imaging of Surface Reconstructions and Metal Growth on Oxides
Atoms and Molecules on TiO2(110) and CeO2(111) Surfaces-. NC-AFM Imaging of Adsorbed Molecules
Organic Molecular Films
Single-Molecule Analysis
Low-Temperature Measurements: Principles, Instrumentation, and Application
Theory of NC-AFM
Chemical Interaction in NC-AFM on Semiconductor Surfaces
Contrast Mechanisms on Insulating Surfaces
Analysis of Microscopy and Spectroscopy Experiments
Theory of Energy Dissipation into Surface Vibrations
Measurement of Dissipation Induced by Tip-Sample Interactions.
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| September 13, 2021 | Edited by ImportBot | import existing book |
| July 5, 2019 | Created by MARC Bot | import new book |


