An edition of Reliability wearout mechanisms in advanced CMOS technologies
(2008)
Reliability wearout mechanisms in advanced CMOS technologies
by Alvin Wayne Strong, Alvin W. Strong, Ernest Y. Wu, Rolf-peter Vollertsen, Jordi Sune, and Guiseppe La Rosa
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| Edition | Availability |
|---|---|
1
Reliability wearout mechanisms in advanced CMOS technologies
2009, IEEE Press, Wiley
in English
0471731722 9780471731726
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2
Reliability Wearout Mechanisms in Advanced CMOS Technologies
2009, Wiley & Sons, Incorporated, John
in English
047045525X 9780470455258
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3
Reliability Wearout Mechanisms in Advanced CMOS Technologies (Ieee Press Series on Microelectronic Systems)
April 22, 2008, Ieee
Hardcover
in English
0471731722 9780471731726
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Book Details
Table of Contents
Introduction / Alvin W. Strong
Dielectric characterization and reliability methodology / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Suñé
Dielectric breakdown of gate oxides: physics and experiments / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Suñé
Negative bias temperature instabilities in pMOSFET devices / Giuseppe LaRosa
Hot carriers / Stewart E. Rauch, III
Stress-induced voiding / Timothy D. Sullivan
Electromigration / Timothy D. Sullivan.
Edition Notes
Includes bibliographical references and index.
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