| Record ID | marc_western_washington_univ/wwu_bibs.mrc_revrev.mrc:688153030:859 |
| Source | Western Washington University |
| Download Link | /show-records/marc_western_washington_univ/wwu_bibs.mrc_revrev.mrc:688153030:859?format=raw |
LEADER: 00859cam 2200277Ia 4500
001 ocm42707637
003 OCoLC
005 20000209134257.0
008 991026s2000 caua b 001 0 eng d
020 $a0127521720
040 $aXRL$cXRL$dCOD$dXFF
049 $aXFFA
090 $aQC612.S4$bW5 v. 63
245 00 $aChemical mechanical polishing in silicon processing /$cVolume editors Shin Hwa Li, Robert O. Miller.
260 $aSan Diego, CA :$bAcademic Press,$cc2000.
300 $axv, 307 p. :$bill. ;$c24 cm.
440 0 $aSemiconductors and semimetals ;$vv. 63
504 $aIncludes bibliographical references and index.
650 0 $aGrinding and polishing.
650 0 $aSilicon.
700 1 $aLi, Shin Hwa.
700 1 $aMiller, Robert O.,$d1947-
907 $a.b19008193$bmulti$c-
902 $a070705
998 $b1$c000209$dm$ea$f-$g0
902 $asc