| Record ID | marc_records_scriblio_net/part26.dat:220473853:949 |
| Source | Scriblio |
| Download Link | /show-records/marc_records_scriblio_net/part26.dat:220473853:949?format=raw |
LEADER: 00949cam 2200253 a 4500
001 97176703
003 DLC
005 19990823142210.0
008 970728s1997 coua b f000 0 eng
010 $a 97176703
040 $aDLC$cDLC
050 00 $aQC100$b.U5753 no. 1390$aTK7871.85
082 00 $a602/.18 s$a621.3815/2$221
100 1 $aRanda, J.
245 10 $aNoise temperature measurements on wafer /$cJ. Randa.
260 $aBoulder, Colo. :$bU.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology ;$aWashington :$bFor sale by the Supt. of Docs., U.S. G.P.O.,$c[1997]
300 $aiii, 57 p. :$bill. ;$c28 cm.
440 0 $aNIST technical note ;$v1390
500 $a"March 1997."
504 $aIncludes bibliographical references (p. 33-36).
650 0 $aSemiconductor wafers$xTesting.
650 0 $aCurrent noise (Electricity)
650 0 $aElectronic noise$xMeasurement.
650 0 $aImpedance matching.