| Record ID | marc_records_scriblio_net/part22.dat:162214104:729 |
| Source | Scriblio |
| Download Link | /show-records/marc_records_scriblio_net/part22.dat:162214104:729?format=raw |
LEADER: 00729pam 2200229 a 4500
001 92021803
003 DLC
005 19930422102344.4
008 920610s1993 nyua b 001 0 eng
010 $a 92021803
020 $a0895737450
020 $a3527278427
040 $aDLC$cDLC$dDLC
050 00 $aQC482.D5$bX74 1993
082 00 $a548/.83$220
245 00 $aX-ray diffraction at elevated temperatures :$ba method for in situ process analysis /$cD.D.L. Chung ... [et al.].
260 $aNew York :$bVCH,$cc1993.
300 $aviii, 268 p. :$bill. ;$c24 cm.
504 $aIncludes bibliographical references and index.
650 0 $aX-rays$xDiffraction.
650 0 $aX-rays$xIndustrial applications.
700 10 $aChung, Deborah D. L.