| Record ID | marc_loc_updates/v39.i51.records.utf8:6243124:794 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v39.i51.records.utf8:6243124:794?format=raw |
LEADER: 00794cam a2200241 a 4500
001 82016769
003 DLC
005 20111219112104.0
008 820819s1982 gw a b 001 0 eng
010 $a 82016769
020 $a0387118624 (U.S.)
040 $aDLC$cDLC$dDLC$dOCoLC$dDLC
050 00 $aQD921$b.C8 vol. 8$aQD181.S6
082 00 $a548 s$a546/.683$219
245 00 $aSilicon, chemical etching /$ceditor, J. Grabmaier ; with contributions by R.B. Heimann ... [et al.].
260 $aBerlin ;$aNew York :$bSpringer-Verlag,$c1982.
300 $a226 p. :$bill. ;$c25 cm.
440 0 $aCrystals ;$v8
504 $aIncludes bibliographical references and index.
650 0 $aSilicon.
650 0 $aCrystals$xEtching.
700 1 $aGrabmaier, J.
700 1 $aHeimann, R. B.$q(Robert Bertram),$d1938-