| Record ID | marc_loc_updates/v36.i10.records.utf8:4282411:952 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v36.i10.records.utf8:4282411:952?format=raw |
LEADER: 00952cam a2200277 a 4500
001 91041122
003 DLC
005 20080310122701.0
008 911023s1992 nyua b 001 0 eng
010 $a 91041122
020 $a0306435780
040 $aDLC$cDLC$dDLC
050 00 $aTK7874$b.V336 1992
082 00 $a621.381/531$220
100 1 $aValiev, Kamilʹ Akhmetovich.
245 14 $aThe physics of submicron lithography /$cKamil A. Valiev.
260 $aNew York :$bPlenum Press,$cc1992.
300 $axi, 493 p. :$bill. ;$c26 cm.
440 0 $aMicrodevices
504 $aIncludes bibliographical references and index.
650 0 $aLithography, Electron beam.
650 0 $aX-ray lithography.
650 0 $aIon beam lithography.
650 0 $aPhysics.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/enhancements/fy0820/91041122-d.html
856 41 $3Table of contents only$uhttp://www.loc.gov/catdir/enhancements/fy0820/91041122-t.html