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MARC Record from Library of Congress

Record ID marc_loc_2016/BooksAll.2016.part37.utf8:95836136:1524
Source Library of Congress
Download Link /show-records/marc_loc_2016/BooksAll.2016.part37.utf8:95836136:1524?format=raw

LEADER: 01524cam a22004697a 4500
001 2009921817
003 DLC
005 20110503082502.0
008 090129s2009 ne a b 001 0 eng
010 $a 2009921817
020 $a9783540858485 (alk. paper)
020 $a9783540858492 (ebk.)
028 52 $a11780793
035 $a(OCoLC)ocn277069476
040 $aUKM$cUKM$dBTCTA$dAGL$dZCU$dGBVCP$dDEBBG$dYDXCP$dBWX$dDLC
042 $aukblcatcopy$alccopycat
050 00 $aTA2020$b.F73 2009
070 0 $aTA2020$b.F73 2009
082 04 $a621.044$222
084 $a620$2sdnb
084 $aUR 8000$2rvk
084 $aZM 7680$2rvk
100 1 $aFranz, Gerhard,$cDr. rer. nat.
245 10 $aLow pressure plasmas and microstructuring technology /$cGerhard Franz.
260 $aBerlin :$bSpringer,$cc2009.
300 $axxiv, 732 p. :$bill. ;$c24 cm.
504 $aIncludes bibliographical references (p. 669-703) and index.
650 0 $aPlasma (Ionized gases)$xIndustrial applications.
650 0 $aPlasma engineering.
650 0 $aPlasma etching.
650 4 $aIonenstrahlbearbeitung.
650 4 $aNiederdruckplasma$xHochfrequenzentladung.
650 4 $aPECVD-Verfahren$xSputtern.
650 4 $aPlasmaätzen.
650 4 $aPlasmadiagnostik.
650 07 $aHochfrequenzentladung.$2swd
650 07 $aIonenstrahlbearbeitung.$2swd
650 07 $aNiederdruckplasma.$2swd
650 07 $aPECVD-Verfahren.$2swd
650 07 $aPlasmadiagnostik.$2swd
650 07 $aPlasmaätzen.$2swd
650 07 $aSputtern.$2swd