| Record ID | marc_loc_2016/BooksAll.2016.part33.utf8:84303407:1307 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part33.utf8:84303407:1307?format=raw |
LEADER: 01307cam a22003257a 4500
001 2005928963
003 DLC
005 20080308092451.0
008 050610s2005 gw a b 001 0 eng
010 $a 2005928963
015 $aGBA589495$2bnb
016 7 $a013318762$2Uk
020 $a9783540016052 (acid-free paper)
020 $a3540016058 (acid-free paper)
035 $a(OCoLC)ocm62177378
040 $aUKM$cUKM$dBAKER$dDLC
042 $aukblsr$alccopycat
050 00 $aQD411.7.S94$bP74 2005
082 04 $a547.05$222
245 00 $aPrecursor chemistry of advanced materials :$bCVD, ALD, and nanoparticles /$cvolume editor: Roland A. Fischer ; with contributions by M.D. Allendorf ... [et al.].
260 $aBerlin ;$aNew York :$bSpringer,$c2005.
300 $axv, 213 p. :$bill. ;$c25 cm.
440 0 $aTopics in organometallic chemistry,$x1436-6002 ;$v9
504 $aIncludes bibliographical references and index.
650 0 $aOrganometallic compounds$xSynthesis.
650 0 $aMetal organic chemical vapor deposition.
650 0 $aChemical vapor deposition.
700 1 $aFischer, Roland A.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/enhancements/fy0662/2005928963-d.html
856 41 $3Table of contents only$uhttp://www.loc.gov/catdir/enhancements/fy0816/2005928963-t.html