| Record ID | marc_loc_2016/BooksAll.2016.part28.utf8:102494062:1076 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part28.utf8:102494062:1076?format=raw |
LEADER: 01076cam a2200301 a 4500
001 99233639
003 DLC
005 20030910203621.0
008 990621s1999 gw a b 001 0 eng
010 $a 99233639
015 $aGB99-Z3958
020 $a3527295615
035 $a(OCoLC)40684553
040 $aDLC$cDLC$dDLC
041 1 $aeng$hger
050 00 $aTK7872.M3$bK64 1999
082 00 $a621.3815/31$221
100 1 $aKöhler, J. M.$q(J. Michael),$d1956-
240 10 $aÄtzverfahren für die Mikrotechnik.$lEnglish
245 10 $aEtching in microsystem technology /$cMichael Köhler ; translated by Antje Wiegand.
260 $aWeinheim ;$aNew York :$bWiley-VCH,$cc1999.
300 $axvi, 368 p. :$bill. ;$c25 cm.
504 $aIncludes bibliographical references ([345]-360) and index.
650 0 $aMasks (Electronics)
650 0 $aMicrolithography.
650 0 $aPlasma etching.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/description/wiley033/99233639.html
856 41 $3Table of contents$uhttp://www.loc.gov/catdir/toc/wiley022/99233639.html