| Record ID | marc_loc_2016/BooksAll.2016.part19.utf8:100372564:1472 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part19.utf8:100372564:1472?format=raw |
LEADER: 01472pam a2200313 a 4500
001 89017931
003 DLC
005 20060719181707.0
008 890828s1989 dcua b 101 0 eng
010 $a 89017931
020 $a0841217017 (alk. paper)
040 $aDLC$cDLC$dDLC
050 00 $aTK7871.15.P6$bP635 1989
082 00 $a621.381/531$220
245 00 $aPolymers in microlithography :$bmaterials and processes /$cElsa Reichmanis, editor, Scott A. MacDonald, editor, Takao Iwayanagi, editor.
260 $aWashington, DC :$bAmerican Chemical Society,$c1989.
300 $axii, 449 p. :$bill. ;$c24 cm.
440 0 $aACS symposium series,$x0097-6156 ;$v412
500 $a"Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 197th national meeting of the American Chemical Society, Dallas, Texas, April 9-14, 1989."
504 $aIncludes bibliographical references.
650 0 $aPolymers$xCongresses.
650 0 $aPhotoresists$xCongresses.
650 0 $aMicrolithography$xMaterials$xCongresses.
700 1 $aReichmanis, Elsa,$d1953-
700 1 $aMacDonald, Scott A.
700 1 $aIwayanagi, Takao,$d1949-
710 2 $aAmerican Chemical Society.$bDivision of Polymeric Materials: Science and Engineering.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/enhancements/fy0604/89017931-d.html
856 41 $3Table of contents only$uhttp://www.loc.gov/catdir/enhancements/fy0604/89017931-t.html