| Record ID | marc_loc_2016/BooksAll.2016.part09.utf8:47369789:767 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part09.utf8:47369789:767?format=raw |
LEADER: 00767cam a2200229 4500
001 75107563
003 DLC
005 19730611000000.0
008 700825s1970 nyua b 00110 eng
010 $a 75107563
020 $a0124808506
050 0 $aTK7871.85$b.M38
082 $a621.381/52
100 10 $aMayer, James W.,$d1930-
245 10 $aIon implantation in semiconductors, silicon and germanium$c[by] James W. Mayer, Lennart Eriksson and John A. Davies.
260 0 $aNew York,$bAcademic Press,$c1970.
300 $axiii, 280 p.$billus.$c24 cm.
504 $aIncludes bibliographical references.
650 0 $aIon implantation.
650 0 $aSemiconductors.
700 10 $aEriksson, Lennart,$d1938-$ejoint author.
700 10 $aDavies, John Arthur,$d1927-$ejoint author.