| Record ID | marc_columbia/Columbia-extract-20221130-009.mrc:135984243:1187 |
| Source | marc_columbia |
| Download Link | /show-records/marc_columbia/Columbia-extract-20221130-009.mrc:135984243:1187?format=raw |
LEADER: 01187cam a22003134a 4500
001 4098895
005 20221027034557.0
008 030326t20032003ne a b 001 0 eng
010 $a 2003047499
020 $a1402012489 (alk. paper)
035 $a(OCoLC)ocm52058209
035 $a(NNC)4098895
035 $a4098895
040 $aDLC$cDLC$dYDX$dOHX
042 $apcc
050 00 $aTS695$b.D63 2003
072 7 $aTS$2lcco
082 00 $a671.7/35$221
100 1 $aDobkin, Daniel Mark.$0http://id.loc.gov/authorities/names/n89619205
245 10 $aPrinciples of chemical vapor deposition /$cby Daniel M. Dobkin and Michael K. Zuraw.
260 $aDordrecht ;$aBoston :$bKluwer Academic Publishers,$c[2003], ©2003.
300 $axi, 273 pages :$billustrations ;$c25 cm
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
504 $aIncludes bibliographical references and index.
650 0 $aVapor-plating.$0http://id.loc.gov/authorities/subjects/sh85142069
650 0 $aRefractory coating.$0http://id.loc.gov/authorities/subjects/sh85112268
700 1 $aZuraw, Michael K.$0http://id.loc.gov/authorities/names/n2003004273
852 00 $boff,eng$hTS695$i.D63 2003