MARC Record from marc_columbia

LEADER: 02113mam a2200361 a 4500
001 3123574
005 20221019224349.0
008 011016t20012001waua b 101 0 eng d
020 $a0819440299
035 $a(OCoLC)ocm48153041
035 $9ATV6017CU
035 $a(NNC)3123574
035 $a3123574
040 $aLHL$cLHL
090 $aTK7874$b.E56 2001
245 00 $aEmerging lithographic technologies V :$b27 February-1 March, 2001, Santa Clara, [California], USA /$cElizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
260 $aBellingham, Washington :$bSPIE,$c[2001], ©2001.
300 $axv, 818 pages :$billustrations (some color) ;$c28 cm.
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
490 1 $aProceedings of SPIE ;$vv. 4343
504 $aIncludes bibliographic references and author index.
650 0 $aLithography, Electron beam$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2009130002
650 0 $aMicrolithography$xIndustrial applications$vCongresses.
650 0 $aX-ray lithography$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008114009
650 0 $aX-rays$xIndustrial applications$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008124340
650 0 $aMasks (Electronics)$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2010100831
700 1 $aDobisz, Elizabeth A.$q(Elizabeth Ann)$0http://id.loc.gov/authorities/names/n86860021
710 2 $aSociety of Photo-optical Instrumentation Engineers.$0http://id.loc.gov/authorities/names/n78088934
710 2 $aSemiconductor Equipment and Materials International.$0http://id.loc.gov/authorities/names/n90682619
710 2 $aInternational SEMATECH.$0http://id.loc.gov/authorities/names/no2001094348
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 4343.$0http://id.loc.gov/authorities/names/n42030541
852 00 $boff,eng$hTK7874$i.E523 2001g