MARC Record from marc_columbia

LEADER: 02101mam a2200361 a 4500
001 2669921
005 20221012215726.0
008 000808t20002000waua b 101 0 eng d
020 $a0819436151
035 $a(OCoLC)ocm44738861
035 $9ARB8199CU
035 $a(NNC)2669921
035 $a2669921
040 $aLHL$cLHL
090 $aTK7874$b.E56 2000
245 00 $aEmerging lithographic technologies IV :$b28 February-1 March, 2000, Santa Clara, [California], USA /$cElizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
260 $aBellingham, Washington :$bSPIE,$c[2000], ©2000.
300 $axv, 900 pages :$billustrations ;$c28 cm.
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
490 1 $aProceedings of SPIE ;$vv. 3997
504 $aIncludes bibliographic references and author index.
650 0 $aLithography, Electron beam$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2009130002
650 0 $aMicrolithography$xIndustrial applications$vCongresses.
650 0 $aX-ray lithography$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008114009
650 0 $aX-rays$xIndustrial applications$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008124340
650 0 $aMasks (Electronics)$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2010100831
700 1 $aDobisz, Elizabeth A.$q(Elizabeth Ann)$0http://id.loc.gov/authorities/names/n86860021
710 2 $aSociety of Photo-optical Instrumentation Engineers.$0http://id.loc.gov/authorities/names/n78088934
710 2 $aSemiconductor Equipment and Materials International.$0http://id.loc.gov/authorities/names/n90682619
710 2 $aInternational SEMATECH.$0http://id.loc.gov/authorities/names/no2001094348
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 3997.$0http://id.loc.gov/authorities/names/n42030541
852 00 $boff,eng$hTK7874$i.E523 2000g