MARC Record from marc_columbia

LEADER: 02216cam a2200409 a 4500
001 181236
005 20220518211936.0
008 830926s1983 dcua b 101 0 eng
010 $a 83005968
020 $a0841207755
035 $a(OCoLC)9371344
035 $a(OCoLC)ocm09371344
035 $a(CStRLIN)NYCG83-B56657
035 $9AAV1840CU
035 $a(NNC)181236
035 $a181236
050 00 $aTR940$b.I57 1983
082 0 $a686.2/315$219
090 $aTR940$b.I57 1983
245 00 $aIntroduction to microlithography :$btheory, materials, and processing /$cL.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.
260 $aWashington, D.C. :$bThe Society,$c1983.
300 $aix, 363 pages :$billustrations ;$c24 cm.
336 $atext$2rdacontent
337 $aunmediated$2rdamedia
338 $avolume$2rdacarrier
490 1 $aACS symposium series,$x0097-6156 ;$v219
504 $aIncludes bibliographical references and index.
505 0 $aAn introduction to lithography / L.F. Thompson -- The lithographic process--the physics / L.F. Thompson and M.J. Bowden -- Organic resist materials--theory and chemistry / C. Grant Willson -- Resist processing / L.F. Thompson and M.J. Bowden -- Plasma etching / J.A. Mucha and D.W. Hess -- Multi-layer resist systems / B.J. Lin.
650 0 $aPhotolithography$vCongresses.
650 0 $aPhotoresists$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2010106194
700 1 $aThompson, L. F.,$d1944-$0http://id.loc.gov/authorities/names/n83040713
700 1 $aWillson, C. G.$q(C. Grant),$d1939-$0http://id.loc.gov/authorities/names/n83040714
700 1 $aBowden, M. J.,$d1943-$0http://id.loc.gov/authorities/names/n83040715
710 2 $aAmerican Chemical Society.$bDivision of Organic Coatings and Plastics Chemistry.$0http://id.loc.gov/authorities/names/n83162446
710 2 $aAmerican Chemical Society.$bMeeting$n(185th :$d1983 :$cSeattle, Wash.)
830 0 $aACS symposium series ;$v219.
852 00 $boff,che$hTR940$i.I57 1983