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MARC record from Internet Archive

LEADER: 04968cam 2200781Ma 4500
001 ocm49708232
003 OCoLC
005 20201021080935.0
008 011108s1993 njua obf 001 0 eng d
006 m o d
007 cr un|||||||||
010 $a 93004078
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020 $a159124093X$q(electronic bk.)
020 $a9781591240938$q(electronic bk.)
020 $a9780815513315
020 $a0815513313
020 $a0815517726
020 $a9780815517726
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042 $adlr
050 4 $aTK7871.85$b.H335 1993eb
082 04 $a621.3815/2$222
245 00 $aHandbook of semiconductor wafer cleaning technology :$bscience, technology, and applications /$cedited by Werner Kern.
260 $aPark Ridge, N.J., U.S.A. :$bNoyes Publications,$c©1993.
300 $a1 online resource (xx, 623 pages) :$billustrations.
336 $atext$btxt$2rdacontent
337 $acomputer$bc$2rdamedia
338 $aonline resource$bcr$2rdacarrier
490 1 $aMaterials science and process technology series. Electronic materials and process technology
520 $aDiscusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field.
504 $aIncludes bibliographical references and index.
588 0 $aPrint version record.
505 0 $a12. Ultratrace Impurity Analysis of Silicon Surfaces by SIMS and TXRF Methods / Richard S. Hockett -- 13. Future Directions / Werner Kern.
506 $3Use copy$fRestrictions unspecified$2star$5MiAaHDL
533 $aElectronic reproduction.$b[S.l.] :$cHathiTrust Digital Library,$d2010.$5MiAaHDL
538 $aMaster and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.$uhttp://purl.oclc.org/DLF/benchrepro0212$5MiAaHDL
583 1 $adigitized$c2010$hHathiTrust Digital Library$lcommitted to preserve$2pda$5MiAaHDL
546 $aEnglish.
650 0 $aSemiconductor wafers$xCleaning.
650 7 $aSemiconductor wafers$xCleaning.$2fast$0(OCoLC)fst01112190
650 7 $aSemicondutores.$2larpcal
650 7 $aElectrical & Computer Engineering.$2hilcc
650 7 $aEngineering & Applied Sciences.$2hilcc
650 7 $aElectrical Engineering.$2hilcc
655 4 $aElectronic books.
655 0 $aElectronic books.
700 1 $aKern, Werner,$d1925-
776 08 $iPrint version:$tHandbook of semiconductor wafer cleaning technology.$dPark Ridge, N.J., U.S.A. : Noyes Publications, ©1993$z0815513313$w(DLC) 93004078$w(OCoLC)27976222
830 0 $aMaterials science and process technology series.$pElectronic materials and process technology.
856 40 $3Google$uhttp://books.google.com/books?id=AAJTAAAAMAAJ
856 40 $3HathiTrust Digital Library, Limited view (search only)$uhttp://catalog.hathitrust.org/api/volumes/oclc/27976222.html
856 40 $3Knovel$uhttp://app.knovel.com/hotlink/toc/id:kpHSWCTSTB/handbook-of-semiconductor
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856 40 $uhttps://app.knovel.com/web/toc.v/cid:kpHSWCTSTB/viewerType:toc/root_slug:handbook-semiconductor-2
856 40 $uhttp://ezproxy.lib.ryerson.ca/login?url=http://app.knovel.com/hotlink/toc/id:kpHSWCTSTB/handbook-of-semiconductor
856 42 $3Publisher description$uhttp://catdir.loc.gov/catdir/description/wap041/93004078.html
856 40 $zElectronic Resource$uhttps://www.lib.uts.edu.au/goto?url=http://app.knovel.com/hotlink/toc/id:kpHSWCTSTB/handbook-of-semiconductor
856 41 $uhttp://www.knovel.com/knovel2/Toc.jsp?BookID=132$w(OCLC)49708232$zAvailable from: <b>Knovel</b>$zAccess restricted to computer accounts recognised as belonging to Griffith University
856 40 $uhttp://link.lis.curtin.edu.au/cgi-bin/gw?url=http://www.knovel.com/knovel2/Toc.jsp?BookID=132$zClick here to view book
856 40 $zVIEW FULL TEXT$uhttp://VH7QX3XE2P.search.serialssolutions.com/?V=1.0&L=VH7QX3XE2P&S=JCs&C=TC0000403923&T=marc&tab=BOOKS
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948 $hHELD BY P4A - 282 OTHER HOLDINGS